Instrument name | Reactive Ion Etcher (RIE) |
Model | Plasmalab 80plus RIE |
Manufacturer | Oxford Instruments |
Specifications | 1.Etching Materials: Si, SiO2, Si3N4 2.Sample Size: Maximum Size 200 mm 3.RF Power: Frequency 13.56 MHZ, Power Adjust Range is 0-600 W 4. Gas Supply: include CF4, CHF3, SF6, N2, He, O2, Ar etc. 5.Control System: PC+PLC Control |
Function and applications | Reactive ion etching (RIE) machine is mostly used in the field of fabrication of micro/nano device. Our RIE instrument could etched Si, SiO2 and Si3N4. |
Accessories | Dry Pump |
Contacts: Wenchang Zhu | |
Contact number: 65881259 | |
E-mail: wczhu@suda.edu.cn | |
Editor: Wenchang Zhu