Presenter: Dr. André Anders (LawrenceBerkeley National Laboratory, Editor-in-Chief of Journal of Applied Physics)
Topic：Microstructure of thin films controlledby plasma assistance of film growth
Time：03:20 PM, Sept 6th
Location：909-B
Abstract
Thinfilms have microstructures that are distinctly different from the structure ofbulk materials. Film microstructure isgreatly influenced by the method of film deposition and deposition conditions. Thetwo major parameter “knobs” were the substrate temperature and sputtering gaspressure. With the advent ofplasma-assistance, many more parameter “knobs” became available due to thepresence of ions and electrons, which contribute to the film growth processthrough kinetic and potential energies. This can be illustrated in a generalized Thornton structure zonediagram. In particular, substrate biasing techniques can affect interfaceintermixing, film density, compressive stress, and crystal grain size, and allthe film properties that are derived from the film microstructure.
Biography
Dr.Anders earned his Ph.D. in physics at Humboldt University Berlin, Germany in1987. Following appointments as Staff Scientist at the Central Institute forElectron Physics (The Academy of Sciences) in (East) Berlin, Germany, and theMax Planck Institute for Plasma Physics in Garching, Germany, Dr. Anders joinedLawrence Berkeley National Laboratory (LBNL) in Berkeley, California, in 1992.Currently holding the prestigious position of Senior Scientist and Leader ofthe Plasma Applications Group at LBNL, Dr. Anders’ research focuses on plasmaphysics and materials science, and his research interests include coatings andthin film synthesis, high power impulse magnetron sputtering, cathodic vacuumarc plasma and ion sources, gas plasma sources, ion implantation, and plasmaimmersion ion implantation, transparent conducting oxides, and electrochromicmaterials. Dr. Anders has published three books, authored or co-authored morethan 300 articles in peer-reviewed publications and holds 16 patents.
Dr.Anders is recognized by election to Fellow of four scientific societies (APS,AVS, IEEE, IoP) and through numerous awards, including the Walter Dyke Award,the highest award of the International Symposia on Electrical Discharges andInsulation in Vacuum (2014), Mentor Award of the Society of Vacuum Coaters(2011), IEEE Merit Award of the IEEE Nuclear and Plasma Sciences Society(2010), and the Chatterton Award (1994). In 2016 he received the Nathaniel H.Sugerman Memorial Award, the highest award of the Society of Vacuum Coaters(SVC). Dr. Anders has served as Associate Editor of Journal of Applied Physicsfrom 2009 to 2014, and was appointed Editor-in-Chief in 2014.
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