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  • 阿卜杜拉国王科技大学Udo教授10月19日下午学术报告

    作者:杨娟 发布时间:2017-10-09 浏览次数:1363

    报告人:Prof. Udo Schwingenschlögl

     

    Materials Science & Engineering at King Adbullah University of

    Science and Technology (KAUST)

     

    报告题目:Substrate effects on silicene and how to exploit them

    报告时间:01:00 p.m., October 19th (Thursday)

    报告地点:Conference Room 308, BLDG 910-3F

     

    Abstract

    Silicene is the Si analogue of graphene with the same honeycomb structure and linear dispersions of the π and π* bands at the K point of the Brillouin zone. It is predicted to realize a buckled structure, due to sp2-sp3 hybridization, and is compatible with the current Si-based nano-electronics. Silicene yet has not been achieved by mechanical exfoliation but can be deposited on metallic substrates such as Ag(111), Ir(111), and ZrB2(0001). Regrettably, strong interaction with these substrates destroys the Dirac physics. Layered materials such as MgBr2(0001), MoX2, and GaX2 (X = S, Se, and Te), on the other hand, might preserve the characteristic electronic features. The effects of different substrates on silicene will be compared and evaluated with respect to technological requirements.

     

    Biography

    Udo Schwingenschlögl is a Professor of Materials Science & Engineering at King Abdullah University of Science and Technology (KAUST). His research interests in condensed matter physics and first-principles materials modeling focus on two-dimensional materials, interface and defect physics, correlated materials, thermoelectric materials, metal-ion batteries, nanoparticles, and quantum transport.

     

    Contact: Prof. Mario Lanza

     

     

    责任编辑:杨娟