题目： | Wafer-Scale Precise Patterning of Organic Single-Crystal Nanowire Arrays via a Photolithography-Assisted Spin-Coating Method |
作者： | Wei Deng, Xiujuan Zhang,* Liang Wang, Jincheng Wang,Qixun Shang, Xiaohong Zhang,* Liming Huang, and Jiansheng Jie* |
单位： | Institute of Functional Nano and Soft Materials (FUNSOM) and Collaborative Innovation Center of Suzhou Nano Science and Technology, Jiangsu Key Laboratory for Carbon-Based Functional Materials & Devices, Soochow University, Suzhou, Jiangsu 215123, P. R. China |
摘要： | A photolithography-assisted spin-coating approach is developed to produce single-crystal organic nanowire (NW) arrays at designated locations with high precision and high efficiency. This strategy enables the large-scale fabrication of organic NW arrays with nearly the same accuracy, reliability, and flexibility as photolithography. The high mobilities of the organic NWs enable the control of the switch of multicolored light-emitting devices with good stability. |
影响因子： | 17.493 |
分区情况： | 1区 |
链接： | http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201503019/abstract 责任编辑：向丹婷 |